http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017199881-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1374dd16777534b65ad4422333245af8
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23K26-351
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-268
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-266
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-265
filingDate 2016-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_69084c3b1ce90e669eb7f887faa1fc4b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be0be52eb1816c3bb7f475d9203f8510
publicationDate 2017-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2017199881-A
titleOfInvention Method for forming mask for ion implantation and method for manufacturing semiconductor device
abstract A method of forming an ion implantation mask used in an ion implantation process in a semiconductor manufacturing process and a method of manufacturing a semiconductor device using the ion implantation mask are provided. The method of the present invention for forming an ion implantation mask having an opening on a semiconductor layer or a substrate (1, 2) includes at least the following steps: (a) a particle dispersion directly or A step of forming the particle film (11) by applying to the whole surface or a part of the semiconductor layer or the substrate (1, 2) through the transfer substrate; and (b) a part of the particle film (11). A step of forming an opening of the ion implantation mask by performing light irradiation (5) to remove the light irradiated portion of the particle film (11). The method of the present invention for manufacturing a semiconductor device includes a step of implanting ions into the semiconductor layer or the substrate through an opening of an ion implantation mask formed by the method of the present invention. [Selection] Figure 1
priorityDate 2016-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 38.