http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017191171-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 |
| filingDate | 2016-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_62b7f0823e14d298246464a06931fe82 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d2fcb2b9e03d298637639953c03026fc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c29347a53446f4bea74e609698bc2383 |
| publicationDate | 2017-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2017191171-A |
| titleOfInvention | Photosensitive resin composition, photosensitive element, resist pattern forming method and printed wiring board manufacturing method |
| abstract | The present invention provides a photosensitive resin composition capable of forming a resist pattern excellent in resolution, adhesion, and resist skirt generation. A structural unit comprising (A) a binder polymer, (B) a photopolymerizable compound, and (C) a photopolymerization initiator, wherein (A) the binder polymer is derived from at least one of styrene and a styrene derivative. And a structural unit derived from (meth) acrylic acid, and (B) the photopolymerizable compound contains a compound having four or more (meth) acryloyl groups. [Selection figure] None |
| priorityDate | 2016-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 145.