http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017187754-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_129e393582e6bdf4029baf2206522f45 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1339 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 |
filingDate | 2017-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea15b2520f57c3f0117f79e4058be85f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bce53a4e17b8c4d108076561f241a2bc |
publicationDate | 2017-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2017187754-A |
titleOfInvention | Negative siloxane resin composition, photospacer, color filter substrate, and liquid crystal display device |
abstract | Disclosed is a negative resin composition that enables formation of a fine photospacer having excellent mechanical properties such as hardness and extremely good development adhesion. (A) a polysiloxane having a carboxyl group and a radically polymerizable group, (B) a photoradical polymerization initiator, (C) a photopolymerizable monomer, (D) a thioxanthone sensitizer, and (E) A negative type containing a solvent, wherein the content of the (A) polysiloxane is 5 to 40 parts by mass with respect to a total of 100 parts by mass of the (A) polysiloxane and the (C) photopolymerizable monomer. Siloxane resin composition. [Selection figure] None |
priorityDate | 2016-03-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 523.