| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d79a3714d75520adeea100b7ed428a77 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B23-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2033-0095 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02043
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B23-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-623
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02529
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N1-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-73
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02002 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N1-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B29-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-62
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B15-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B35-00 |
| filingDate |
2016-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e687fbc2dc14331f0ed3c8ed428bab3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c64071807e4d1e62b824f7e9a194acc4 |
| publicationDate |
2017-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2017181092-A |
| titleOfInvention |
Cleanliness evaluation method, cleaning condition determination method, and silicon wafer manufacturing method |
| abstract |
A means for accurately evaluating metal contamination of a silicon carbide-based member is provided. A method for evaluating the cleanliness of a member having a silicon carbide surface, wherein the silicon carbide surface is brought into contact with a mixed acid of hydrofluoric acid, hydrochloric acid and nitric acid, and the mixed acid brought into contact with the silicon carbide surface is Concentrating by heating, subjecting the sample solution obtained by diluting the concentrated solution obtained by the concentration to quantitative analysis of metal components by an inductively coupled plasma mass spectrometer, and obtained by the quantitative analysis Evaluating the cleanliness of the member having the silicon carbide surface based on a metal component quantification result. [Selection figure] None |
| priorityDate |
2016-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |