http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017178784-A

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filingDate 2017-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b1f8bafe1a576be3eab6ac938c33bbe7
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publicationDate 2017-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2017178784-A
titleOfInvention Cylindrical sputtering target and manufacturing method thereof
abstract PROBLEM TO BE SOLVED: To provide a cylindrical sintered body having a length in a cylindrical axis direction of 470 mm or more, a cylindrical sputtering target, and methods for producing them. A method of manufacturing a cylindrical sputtering target according to an embodiment of the present invention includes a method of manufacturing a cylindrical sputtering target having a cylindrical sintered body, wherein an oxygen supply port connected to a pipe for supplying oxygen is provided. A cylindrical molded body having a length in the cylindrical axis direction of 600 mm or more is disposed on the provided stage, and oxygen is supplied in the cylindrical axis direction from an oxygen supply port smaller than the inner circumference of the cylinder provided inside the cylindrical molded body. Sintering. In another aspect, the stage may be disposed in the chamber, and a pipe for supplying oxygen may be connected to the oxygen supply port from the outside of the chamber. [Selection] Figure 4
priorityDate 2016-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 28.