| abstract |
[PROBLEMS] To provide a composition capable of forming a cured film having low chemical resistance and excellent chemical resistance, heat resistance and resolution. In addition, a manufacturing method using the same is provided. An alkali-soluble resin, a polysiloxane, a diazonaphthoquinone derivative, a compound that generates an acid or a base by heat or light, which is a polymer comprising a polymer unit containing a carboxyl group and a polymer unit containing an alkoxysilyl group. And a composition comprising a solvent. [Selection figure] None |