http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017171552-A

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filingDate 2016-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2017-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2017171552-A
titleOfInvention Method for producing group III nitride crystal
abstract A method for producing a group III nitride crystal capable of effectively removing inclusions in a growing GaN crystal is provided. A group III nitride crystal manufacturing method includes a mixed melt containing a group III metal and a flux, and a group III manufacturing process for manufacturing a group III nitride crystal on a seed crystal substrate from nitrogen. A method for manufacturing a nitride crystal, wherein a group III nitride crystal is grown on a seed crystal substrate while applying a variable magnetic field to a crystal growth region for growing the group III nitride crystal in a mixed melt in the manufacturing process. . [Selection] Figure 2
priorityDate 2016-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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