| abstract |
Disclosed is a cleaning liquid that is used for removing a residue of a photoresist pattern or an etching residue, which has excellent corrosion resistance against a metal containing cobalt, and a cleaning method using the same. A cleaning liquid contains hydrofluoric acid (A), a tetrazole compound (B), and water (C). As the tetrazole compound (B), a compound represented by the following formula (B1) is preferable. In Formula (B1), R 1 is a hydrogen atom or an organic group, and R 2 is a hydrogen atom, a hydroxyl group, a mercapto group, an amino group, or an organic group. [Chemical 1] [Selection figure] None |