| abstract |
Disclosed is a radiation-sensitive resin composition having excellent LWR performance, EL performance, and the like. A polymer having a first structural unit containing an acid dissociable group, a sulfonate selected from a compound represented by formula (1) and a compound represented by formula (2), and a solvent. A radiation-sensitive resin composition to be contained. In the following formulae, R 4 and R 8 represent a substituted or unsubstituted alicyclic hydrocarbon group having 3 to 20 ring members or an aliphatic heterocyclic group having 3 to 20 ring members. X + is a radiation sensitive onium cation. [Selection figure] None |