http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017147231-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
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filingDate 2017-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8064755a79f4291d05232e5889a2f685
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_84a4609c752ad09e394d84b2f3fd59ec
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publicationDate 2017-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2017147231-A
titleOfInvention Production method of transparent conductive film and laminated structure
abstract Disclosed is a low-resistance transparent conductive film that has excellent adhesion to a semiconductor film, excellent permeability, and excellent acid resistance and durability. A transparent conductive film containing a metal oxide as a main component, a mist or a droplet generated by atomizing or dropping a raw material solution to a substrate with a carrier gas, and then on the substrate. The mist or the droplet is formed by heat reaction by heating. Further, on the transparent conductive film, a semiconductor film, a mist or a droplet generated by atomizing or dropping a raw material solution is transported to a substrate with a carrier gas, and then the mist or the droplet is transported on the substrate. By forming droplets by heat reaction by heating, a laminated structure is obtained. [Selection figure] None
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2022109309-A
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