http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017145165-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fec576c38e34882531ca37d6b922bf42 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C15-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-30 |
| filingDate | 2016-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_096f8d725b9ecc1e82d69b78391ffc5b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d704b090d78338e5466e0052b923dcab |
| publicationDate | 2017-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2017145165-A |
| titleOfInvention | Method for etching glass substrate surface |
| abstract | An object of the present invention is to etch a glass substrate surface by forming a coating on the surface of the glass substrate and then immersing the glass substrate in an etching solution to partially dissolve the coating and the surface of the glass substrate. It is an object of the present invention to provide a method for forming a fine recess on the surface of a glass substrate safely without using hydrofluoric acid as an etching solution. A method for etching a surface of a glass substrate, comprising the following steps (A) to (B). Step (A): Step of forming a coating containing a perfluoropolyether group-containing silane compound on a glass substrate Step (B): The coating is performed by immersing the glass substrate on which the coating is formed in an alkaline solution. Process of dissolving [Selection] Figure 1 |
| priorityDate | 2016-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 32.