| abstract |
A high resolution image having a submicron size is provided. A photoresist composition comprising an acid sensitive polymer and a photoacid generator compound having the formula (I). In the formula, M + is an organic cation, EWG is an electron-withdrawing group, Y is a single bond or a bonding group, R is hydrogen, an alkyl group having a specific structure, an alkenyl group, a cycloalkyl group, a cycloalkenyl group, a heterocycloalkyl group, hetero A cycloalkenyl group, an aryl group, or a heteroaryl group is represented. [Selection figure] None |