http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017119772-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c1755eede76ea7e719a3e0d2843cd793 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-5397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D4-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K3-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D7-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D133-14 |
| filingDate | 2015-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1783c6b89458bb31c6be694314c20b10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_55af40bbdfdcb5d1d314142ddf330765 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_397b15bf7647f02be9a0e42ff0bda59f |
| publicationDate | 2017-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2017119772-A |
| titleOfInvention | Photocurable composition and method for producing electronic component |
| abstract | A cured product film having high heat resistance, light resistance, pencil hardness, and adhesiveness can be obtained, and by using a white pigment, a cured product film having high light reflectance can be obtained. A photocurable composition is provided. A photocurable composition according to the present invention includes an oligomer having two or more ethylenically unsaturated bonds, a phenolic compound, a white pigment, and a photopolymerization initiator, wherein the phenolic compound is an alkyl group. Group, a triazole skeleton-containing group or a triazine skeleton-containing group, and in the phenol compound, the alkyl group, the triazole skeleton-containing group or the triazine skeleton-containing group is at the 2-position, 4-position, and 6 with respect to the phenolic hydroxyl group of the benzene ring. And the acid value of the oligomer having two or more ethylenically unsaturated bonds is 20 mgKOH / g or less. [Selection] Figure 1 |
| priorityDate | 2015-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 138.