http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017107032-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G63-682 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2015-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5db8c0107f535d878c4d0569b9ce62b6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_72037fcedd599540ca9e3a4cd73439a8 |
| publicationDate | 2017-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2017107032-A |
| titleOfInvention | Resist upper layer film forming composition and pattern forming method using the composition |
| abstract | Provided are a resist upper layer film-forming composition exhibiting excellent solubility in an alkaline solution and a pattern forming method using the composition. A composition for forming a resist upper layer film comprising a fluorine atom-containing polymer having a partial structure having alkali dissociation and having at least a structural unit (I) represented by the following general formula (1) or (2): And a pattern forming method using the composition. [Selection figure] None |
| priorityDate | 2015-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 112.