http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017102255-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2055 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-28 |
| filingDate | 2015-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c788af3fd0e79721d5564f64728cea41 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d9a9c4596ed404a4ab04eef308be229b |
| publicationDate | 2017-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2017102255-A |
| titleOfInvention | Positive photoresist composition |
| abstract | Even when development is performed using a basic aqueous solution having a low pH, when the cross section of a resist pattern is observed while suppressing the occurrence of scum, the side wall of the resist portion is perpendicular or substantially perpendicular to the substrate. A positive-type photoresist composition having a certain good shape and capable of forming a fine resist pattern that can be easily peeled off from a substrate, and a photosensitive film comprising the positive-type photoresist composition. To provide a substrate and a method for forming a patterned resist film using the positive photoresist composition. In a positive photosensitive composition containing (A) a novolak resin and (B) a photosensitizer, or containing a naphthoquinonediazide group (A ′) a novolak resin, the composition is soluble in a basic aqueous solution at pH 12. A predetermined amount of (A1) novolac resin having a predetermined structure is contained in (A) novolac resin, or (A ′) novolac resin derived from (A) novolac resin containing a predetermined amount of (A1) novolak resin is used. [Selection figure] None |
| priorityDate | 2015-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 304.