http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017082330-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_19e61764c29c9924fe0ffc919cdcf679
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22C45-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22C45-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-851
filingDate 2016-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a6d50fc08af1a4b747b313ebecbec5ef
publicationDate 2017-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2017082330-A
titleOfInvention CoFe-based alloy and sputtering target material for soft magnetic film layer in perpendicular magnetic recording medium
abstract PROBLEM TO BE SOLVED: To provide a CoFe alloy and a sputtering target material for a soft magnetic thin film layer in a perpendicular magnetic recording medium. SOLUTION: At least in atomic%, Ge, Ru, Rh, Pd, Re, Os, Ir, Pt, Sc, Y, lanthanoid (atomic number 57-71), Ti, Zr, Hf, V, Nb , Ta, Mo, W, B are composed of one or more types, balance Co, Fe and inevitable impurities, and all of the following formulas (1) to (4) are satisfied, and soft magnetism in a perpendicular magnetic recording medium Alloy for membrane layer. (1) 0.1% ≦ TCR ≦ 10% (2) 5% ≦ TAM ≦ 25% (3) 13% ≦ TCR / 2 + TAM + TNM ≦ 25% (4) 0.2 ≦ Fe% / (Fe% + Co%) ≦ 0.80 [Selection] Figure 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20220139876-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021162081-A1
priorityDate 2016-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015166762-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001049425-A
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Total number of triples: 24.