http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017076146-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_44ff3005508304394801e265e503b811 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-70 |
| filingDate | 2016-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b82192c6ec4bd1e0336a3d612e2de7e |
| publicationDate | 2017-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2017076146-A |
| titleOfInvention | Photomask manufacturing method, photomask, pattern transfer method, and display device manufacturing method |
| abstract | A photomask having a fine and highly accurate transfer pattern is manufactured. The method of manufacturing a photomask of the present invention includes a step of preparing a photomask blank in which a lower layer film, an intermediate film, an upper layer film, and a photoresist film are formed on a transparent substrate, and drawing on the photoresist film. And pre-developing to form a first resist pattern, etching the upper layer film using the first resist pattern as a mask, and further etching the intermediate film using the first resist pattern or the etched upper layer film as a mask A preliminary etching step, a step of forming a second resist pattern by performing additional development on the first resist pattern, a step of performing additional etching on the upper layer film using the second resist pattern as a mask, and And a post-etching step of etching the lower layer film using the etched intermediate film as a mask. [Selection] Figure 4 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109388018-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109388018-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210133152-A |
| priorityDate | 2016-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 38.