http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017075226-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
filingDate | 2015-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_652121c0e2f02e00c1d15bb525d74253 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dfd4d0ab397c215a0bf757ebff43c9de |
publicationDate | 2017-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2017075226-A |
titleOfInvention | Manufacturing method of polishing liquid, polishing liquid and polishing method |
abstract | A polishing liquid having an excellent polishing rate ratio of an insulating material to a stopper material is provided. A polishing liquid for removing at least a part of an insulating material by CMP, comprising abrasive grains containing cerium oxide, a glycine compound having a structure represented by the following general formula (1), carvone A polishing liquid comprising: a polymer compound having at least one selected from the group consisting of an acid group and a carboxylate group; and water. [Chemical 1] [Wherein, R 1 and R 2 each independently represent a hydrogen atom or a monovalent substituent. ] [Selection figure] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018186381-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11643573-B2 |
priorityDate | 2015-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 390.