http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017072842-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_44ff3005508304394801e265e503b811 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-32 |
| filingDate | 2016-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b82192c6ec4bd1e0336a3d612e2de7e |
| publicationDate | 2017-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2017072842-A |
| titleOfInvention | Photomask manufacturing method, photomask, pattern transfer method, and flat panel display manufacturing method |
| abstract | Provided are a photomask having a transfer pattern and a method of manufacturing the same, in which alignment of each region is accurately performed in a photomask that needs to be drawn a plurality of times, and the number of executions of a photolithography process can be suppressed. A step of preparing a blank on which a first resist film is formed by laminating a lower layer film and an upper layer film having different exposure light transmittances and having etching selectivity on a transparent substrate; A first resist pattern forming step for forming a film pattern and a temporary pattern, a first etching step for etching the upper layer film using the first resist pattern as a mask, a second resist film forming step on the entire surface, and a second drawing are performed. A second resist pattern forming step for forming a lower layer film pattern, a second etching step for etching the lower layer film using the temporary pattern and the second resist pattern as a mask, and a second step for etching and removing the temporary pattern using the second resist pattern as a mask. 3 manufacturing process. [Selection] Figure 7 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102461906-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210087883-A |
| priorityDate | 2016-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 31.