http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017066429-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6bd0cdbc5c67cf4957ed83c89140748e |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-06 |
| filingDate | 2015-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd18dcefeb54b8a7871e2fa6e4a0e058 |
| publicationDate | 2017-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2017066429-A |
| titleOfInvention | Sputtering apparatus and thin film manufacturing method |
| abstract | The present invention provides a sputtering apparatus that makes it possible to obtain a thin film having high film thickness uniformity even when film formation by sputtering is performed for a long time. A vacuum vessel, a mechanism for continuously transporting a substrate F in a roll-to-roll manner in the vacuum vessel, and a mechanism for generating plasma in a gap between a sputtering cathode 1 and an opposing surface of the substrate F And a film thickness control mask 10 disposed between the target 2 disposed on the sputtering cathode 1 and the substrate F, and a sputtering apparatus for forming a thin film by a sputtering method, A sputtering apparatus using the film thickness control mask 10 made of an iron alloy (invariant steel) containing 34 mass% to 37 mass% nickel and 0 to 10 mass% cobalt. [Selection] Figure 2 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110055505-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111334773-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020083448-A |
| priorityDate | 2015-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.