http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017059658-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d79a3714d75520adeea100b7ed428a77
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
filingDate 2015-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9eaddfae7c121273d664d82a8bff8d1
publicationDate 2017-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2017059658-A
titleOfInvention Epitaxial wafer deposition condition determination method, and epitaxial wafer manufacturing method and manufacturing apparatus
abstract Provided is an epitaxial wafer manufacturing method capable of forming an epitaxial film in consideration of factors other than the film thickness in-plane distribution while keeping the variation in the film thickness in-plane distribution within an allowable range. A method of measuring the thickness of an epitaxial film formed on a wafer and calculating a film thickness in-plane distribution index, which is an index of film thickness variation based on this value, and M (M is 2). For each of all combinations in which 1 to M control factors are selected from the control factors of the above integers), the operation amount of each control factor is optimized so that the film thickness in-plane distribution index is minimized, and the minimum Out of all combinations of the control factors and the process of calculating the predicted value of the in-plane thickness distribution index to be converted, and the predicted value of the in-plane thickness distribution index is within the allowable range, Selecting one of the combinations of control factors based on factors other than. While the dispersion of the in-plane thickness distribution is within an allowable range, other quality is also increased. [Selection figure] None
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018182211-A
priorityDate 2015-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005109303-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426098976
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6327210
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457277700
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24811

Total number of triples: 17.