http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017048463-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6038f17109882ad88e9ba8ea907ebb45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 |
| filingDate | 2016-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b2019deb804b9446e634283d72ec3a2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1fc56d45855925b75afa3dbd744d8920 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a37361f6bc44a91e67d040d34cb3b2c |
| publicationDate | 2017-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2017048463-A |
| titleOfInvention | Etching solution, replenisher, and method for forming copper wiring |
| abstract | An etching solution that can suppress side etching without reducing the linearity of copper wiring (wiring width (W2) at the top of the copper wiring) and suppress variation in wiring width (W1) at the bottom of the copper wiring, and its etching solution A replenisher and a method for forming a copper wiring are provided. The copper etching solution of the present invention contains an acid, an oxidizing metal ion, a bromide ion, and an aliphatic acyclic compound, and the aliphatic acyclic compound contains only nitrogen as a hetero atom. It is a saturated aliphatic acyclic compound (A) having 2 or more carbon atoms and having 2 to 10 carbon atoms. [Selection] Figure 1 |
| priorityDate | 2016-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 778.