Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_20d3042eb4ea7c9afd525aa89373349d |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01R33-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-0025 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C39-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-08 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
filingDate |
2016-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87b99267f268944f21d923986e01fb50 |
publicationDate |
2017-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2017037326-A |
titleOfInvention |
Photosensitive composition for forming resist underlayer film and resist underlayer film |
abstract |
A photosensitive composition for forming a resist underlayer film, which is excellent in dry etching resistance and heat resistance, and whose alkali solubility can be easily controlled, and a resist underlayer film. One or more phenolic trinuclear compounds (A) and aldehydes selected from the group consisting of a compound represented by the following general formula (1) and a compound represented by the following general formula (2) A photosensitive composition for forming a resist underlayer film comprising a novolac type phenolic resin obtained by reacting (B) with an acid catalyst. [Wherein, R1, R2 and R3 each independently represents an alkyl group having 1 to 8 carbon atoms which may have a substituent, and R4 represents a hydrogen atom or an alkyl which may have a substituent. Represents an aryl group which may have a group or a substituent. ] [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102467637-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20210088669-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020137309-A1 |
priorityDate |
2014-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |