http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017034284-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_669c01133740c5233f2c8738904ea3af |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02 |
| filingDate | 2016-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_31128112328d697e0b00e4128836356d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2b9370d45b6977ef295368cfbbeb9728 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_89a0cae2aef71e478cd2250f3b838365 |
| publicationDate | 2017-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2017034284-A |
| titleOfInvention | Method for producing template for nanoimprint |
| abstract | PROBLEM TO BE SOLVED: To provide a method for producing a template for nanoimprint, which makes it possible to produce a fine template having a half pitch of 1X nm class without increasing a pattern drawing time. SOLUTION: A metal thin film and a resist pattern are formed on a light-transmitting substrate, the resist pattern is slimmed, a coating film is formed to cover the resist pattern and the metal thin film, and etched back to form the resist pattern and the metal thin film. And exposing the coating film on the side surface of the resist pattern as a sidewall mask, removing the resist pattern, etching the metal thin film using the sidewall mask to form a metal thin film pattern, removing the sidewall mask, The light transmissive substrate is etched using the thin film pattern as a mask to form an uneven pattern, and the metal thin film pattern is removed. [Selection] Figure 1 |
| priorityDate | 2012-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.