http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017033939-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-10
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filingDate 2016-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c9d92b96d0cc19cadaa158842eb902f7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18af94a76611e9fa7d7a62ec69545ed3
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publicationDate 2017-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2017033939-A
titleOfInvention Parallel line pattern forming method, substrate with transparent conductive film, device and electronic apparatus
abstract A parallel line pattern forming method capable of improving transparency and stability of resistance value in a thin wire pattern of a conductor, and a substrate with a transparent conductive film having excellent characteristics capable of improving transparency when compared with the same resistance value Provided are a device having the substrate with the transparent conductive film and an electronic apparatus including the device. A parallel line pattern forming method for forming a parallel line pattern 3 having at least one set of parallel lines 30 including a conductive material on a base material, the line width including the conductive material on the base material Forming a uniform line-shaped liquid 2 and evaporating the line-shaped liquid 2 while controlling the convection state of the line-shaped liquid 2 to selectively deposit a conductive material on the edge of the line-shaped liquid 2 And a step of causing. [Selection] Figure 1
priorityDate 2016-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 36.