| abstract |
The present invention provides a resist material which reduces acid diffusion, has a higher resolution than conventional resist materials, has a small edge roughness and gives a good pattern shape, and a pattern forming method using the resist material. A repeating unit represented by the following formula (a), a repeating unit in which a hydrogen atom of a carboxyl group is substituted with an acid labile group, and / or a repeating unit in which a hydrogen atom of a phenolic hydroxy group is substituted with an acid labile group And a base material having a weight average molecular weight in the range of 1,000 to 500,000. (Wherein R1 is a hydrogen atom or a methyl group, R2 and R3 are each independently a hydrogen atom or a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms, X1 is a single bond; C 1-12 linking group including ester group, ether group or lactone ring; phenylene group; or naphthylene group, X 2 and X 3 each independently represents an oxygen atom or a sulfur atom. |