http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017003911-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0a4b3776e96d8e853546a4ac6642a4a5 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28 |
| filingDate | 2015-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4cefb8be08652decccbba442a015392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e1b561f3f0424cda8a426ebb1a68784c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e00f60d8ff68e44300f89f973849130 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_232bda819b77d0606d34044c58c5e95c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e383865509e832aee78a0393aa7847b0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94c2074a3f9b1df08ad5708a9641241e |
| publicationDate | 2017-01-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2017003911-A |
| titleOfInvention | Photosensitive resin composition, photosensitive film, screen printing plate material and photosensitive resist film |
| abstract | The present invention provides a photosensitive resin composition that can be stored in a one-pack type for a long period of time and has excellent solvent resistance and water resistance, a photosensitive film using the composition, and a stencil for screen printing. A photosensitive resin composition comprising the following components A to D, comprising: A photosensitive resin composition comprising a mixture of Component B and Component C emulsified and dispersed in the presence of Component D in an aqueous solution of Component A described below. Component A: water-soluble polymer, Component B: a compound having an ethylenically unsaturated bond substituted with at least one amino group, Component C: a radically polymerizable compound having at least one ethylenically unsaturated bond (excluding compounds corresponding to the above component B), Component D: Photoradical polymerization initiator or photoradical polymerization initiation system. A photosensitive film, a screen printing plate, a screen printing stencil, and a photosensitive resist film comprising the photosensitive resin composition described above. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019160079-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111699204-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111856876-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11618742-B2 |
| priorityDate | 2015-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 386.