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filingDate 2014-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2016-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2016519782-A
titleOfInvention Inspection system using 193 nm laser and 193 nm laser
abstract The improved laser uses a pump laser having a wavelength near 1109 nm and a fundamental wavelength near 1171 nm to generate light at a wavelength of about 189 nm to about 200 nm, eg, 193 nm. The laser mixes the 1109 nm pump wavelength with the fifth harmonic of the 1171 nm fundamental, which is a wavelength of about 234.2 nm. With proper choice of nonlinear medium, such mixing can be achieved with near non-critical phase matching. This mixing increases conversion efficiency, improves stability, and increases reliability.
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