http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016224281-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
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filingDate 2015-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99acb4b074094251f50ea6452c55f441
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59cc1ba337e9577cf196b8e0aa546cf7
publicationDate 2016-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2016224281-A
titleOfInvention Lithographic material manufacturing method, lithography composition manufacturing method, and pattern-formed substrate manufacturing method
abstract In a lithography material in which a polymer for lithography is accommodated in a container for storage, transportation, etc., metal impurities in the polymer for lithography are highly reduced while suppressing the burden of introducing equipment. A lithographic polymer or a polymer solution is filled in a container and hermetically sealed, and the filling step is performed in a protective space, the gas in the protective space, and the lithographic polymer. Alternatively, a method for producing a lithographic material in which a polymer solution is contained in a container, wherein a gas that has passed through a filter is supplied to the protective space, and a differential pressure before and after passing through the filter is reduced to 60. A method for producing a lithography material, which is maintained at ˜220 Pa. [Selection figure] None
priorityDate 2015-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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