http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016212350-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
filingDate | 2015-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_48797a2958228a60bffad652d8521f99 |
publicationDate | 2016-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2016212350-A |
titleOfInvention | Insulating film forming photosensitive composition and insulating film pattern forming method |
abstract | Provided are a photosensitive composition capable of improving lithography characteristics while maintaining high electrical characteristics in forming an insulating film, and a method for forming an insulating film pattern using the same. A photosensitive composition for forming an insulating film comprising a silsesquioxane resin (A), an acid generator component (B) that generates an acid upon exposure, and a crosslinking agent component (C). The sesquioxane resin (A) has a structural unit (a1) containing a phenolic hydroxyl group and a structural unit (a2) containing an alkyl group, and the acid generator component (B) has an aromatic ring in the cation part. A photosensitive composition for forming an insulating film, comprising an acid generator (B1) comprising an onium salt with or without only one. [Selection figure] None |
priorityDate | 2015-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 183.