| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C12M3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C12M1-00 |
| filingDate |
2015-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ecaa2fd326e7d96666f03cc889328b84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cf387d30c8e9c28bdda7bf4d935861d8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2876f1562817bbed0293363b3f7e741e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_13b46f8b82fededdfab3700929aac5a6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5708dd69fdc518db0add263db0230e0d |
| publicationDate |
2016-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2016212341-A |
| titleOfInvention |
Photosensitive resin composition and use thereof |
| abstract |
A photosensitive resin composition capable of forming a resin film having a large film thickness and excellent water resistance is provided. SOLUTION: A polymer (A) having a structural unit (A1) and a structural unit (A2) and having an ethylenically unsaturated double bond, a compound (B) having two or more mercapto groups, and radical photopolymerization A photosensitive resin composition containing an initiator (C). [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108479725-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108479725-A |
| priorityDate |
2015-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |