http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016204633-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c0444efde206a2f829562761e58b7e1e |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 2016-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_91167c220ae55b44f563a356ab2bdfc2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fdbece00094dbf94e9f6c14fde5f114e |
| publicationDate | 2016-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2016204633-A |
| titleOfInvention | Resin for photoresist, method for producing photoresist resin, resin composition for photoresist, and pattern forming method |
| abstract | Disclosed is a photoresist resin in which the formation of a component having a high molecular weight at the beginning of dropping is suppressed in dropping polymerization, and a method for producing the same. A resin for a photoresist obtained by radical polymerization of the monomer by a dropping polymerization method in which a monomer and a polymerization initiator are dropped. Between the weight average molecular weight (Mw tA ) of the produced polymer at time t A and the weight average molecular weight (Mw tB ) of the produced polymer at any time t B from the start of the dropping to the end of dropping. , Mw tA <Mw tB when t A <t B is satisfied. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018095687-A |
| priorityDate | 2015-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 144.