http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016204369-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D339-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D321-10 |
| filingDate | 2016-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0106502b1821cd02a499d92f680621ab |
| publicationDate | 2016-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2016204369-A |
| titleOfInvention | Salt, resist composition and method for producing resist pattern |
| abstract | To provide a salt capable of producing a resist pattern having a good focus margin. A salt of at least one anion represented by formula (Ia) and a cation represented by formula (IC). [X a and X b are each independently O or S; X 1 is a divalent saturated hydrocarbon group having 1 or more F; * is a bond; R 1 and R 2 are each independently H, a hydroxy group or A hydrocarbon group, —CH 2 — contained in the hydrocarbon group may be substituted with —O— or —CO—; m and n are each independently 1 or 2; Ar 1 and Ar 2 are each independently Substituted / unsubstituted aromatic hydrocarbon group or substituted / unsubstituted heteroaromatic hydrocarbon group] [Selection figure] None |
| priorityDate | 2015-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 271.