http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016191156-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b55c349b43c3ecba4977fd52cc8f8c67 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-35 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-086 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-5806 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1884 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B5-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B7-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B13-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-44 |
| filingDate | 2016-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e1c4894353694bc065af65559022ba4b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f3568cbb4169b6d99a3480b66f462fb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2041816f0154f721e1a12a76d23aa10f |
| publicationDate | 2016-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2016191156-A |
| titleOfInvention | Transparent conductive film and method for producing the same |
| abstract | To provide a transparent conductive film having a transparent conductive film having a low specific resistance value and a surface resistance value and having a low internal stress and made of a crystalline film on an organic polymer film substrate. A transparent conductive film of the present invention has a transparent conductive film on at least one surface on an organic polymer film substrate, and the transparent conductive film comprises {tetravalent metal element oxide / (4 Oxide of a valence metal element + indium oxide)} × 100 (%) is a crystalline film of an indium-based composite oxide in which the ratio of the oxide of the tetravalent metal element is 7 to 15% by weight. The resistance value is 1.2 × 10 −4 to 2.0 × 10 −4 Ω · cm, the main peaks of the X-ray diffraction peaks are on the (222) plane and the (440) plane, and the peak on the (222) plane The peak intensity ratio (I440 / I222) of the intensity (I222) and the peak intensity (I440) of the (440) plane is less than 0.3, and the internal stress by the X-ray stress measurement method is 700 MPa or less. . [Selection] Figure 1 |
| priorityDate | 2013-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 36.