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publicationDate 2016-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2016191090-A
titleOfInvention Sputtering target material, manufacturing method thereof, and optical functional film
abstract Sputtering target is not only capable of forming an optical functional film that has low reflectivity and is ideal for concealing metallic luster and is excellent in reliability by sputtering on a metal thin film. The basic problem is to provide a sputtering target material that is less likely to crack as the material itself. SOLUTION: Fe and Mo are contained as metal elements, and part or all of the metal elements are present in the form of oxides, and the oxide phase contains a Fe-Mo-O-based compound. Sputtering target material characterized by the above. [Selection] Figure 1
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Total number of triples: 29.