http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016188438-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ad2cd796f8c4dcb425ddcc68707d3444
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B9-00
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filingDate 2016-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1e2ef8656be0351e31505ab6438f1e7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66a998052f634ff911f2e3f1fe010b70
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publicationDate 2016-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2016188438-A
titleOfInvention Method for producing gas barrier laminate film
abstract PROBLEM TO BE SOLVED: To use the present invention for industrial applications such as various foods and pharmaceuticals, industrial product packaging, solar cells, electronic paper, organic EL elements, semiconductor elements, etc. that require high gas barrier properties and durability. An object of the present invention is to provide a gas barrier film having excellent gas barrier properties. A method for producing a transparent gas barrier film in which an inorganic compound thin film is formed on at least one surface of a plastic film substrate, wherein the inorganic compound thin film has an electronegativity difference (ΔD) between constituent elements of the compound. Is a method for producing a transparent gas barrier film, wherein the inorganic compound thin film comprises a group 2 of the periodic table. A method for producing a transparent gas barrier film formed of an oxide, nitride, or mixture of at least one element selected from the group consisting of Group 3, Group 4 and Group 5 elements. [Selection figure] None
priorityDate 2011-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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