| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L63-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2015-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9632c378bbbb5ccce1b6d3d6cdef604
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6d51d7ae20f8c74aaa33d1d12093af9a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6dcd6134cfdfac299a4da780116b9750
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0113bf46b0148573916b4089ff4210f7 |
| publicationDate |
2016-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2016142939-A |
| titleOfInvention |
Photosensitive resin composition |
| abstract |
A photosensitive resin composition capable of forming a resist pattern that is particularly excellent in HAST resistance between fine wirings. A photosensitive resin composition containing a component (A): a novolac epoxy resin derived from cresol and bisphenol, a component (B): a photopolymerizable compound, and a component (C): a photopolymerization initiator. [Selection figure] None |
| priorityDate |
2015-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |