http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016109855-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G75-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G65-34 |
| filingDate | 2014-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b6ea4d8e77ada94c34fffdcefacd2392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6fbbff6a336955e54bb9ee56accc3bde http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d3e728fb292664c4864b89fd12585bdc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d6b2feff4f57b49cb6483c8beb739484 |
| publicationDate | 2016-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2016109855-A |
| titleOfInvention | Radiation-sensitive resin composition, insulating film, method for forming the same, and display element |
| abstract | Disclosed is a radiation-sensitive resin composition that can form an insulating film having excellent low dielectric properties, adhesion, and light transmission in a laminated state, and is excellent in storage stability, and formed from this radiation-sensitive resin composition Provided are an insulating film, a method for forming the insulating film, and a display element including the insulating film. The present invention is a radiation-sensitive resin composition comprising a polymer having a structural unit represented by the following formula (1) and a radiation-sensitive compound. In Formula (1), W 1 is a divalent aromatic ring group having at least an electron-withdrawing group, or a plurality of divalent aromatic ring groups optionally having a substituent is an electron-withdrawing linking group. It is a divalent group formed by linking. W 2 is a divalent aromatic ring group that may have a substituent, or a divalent group in which a plurality of divalent aromatic ring groups that may have a substituent are connected by a linking group. It is. Y 1 and Y 2 are each independently an oxygen atom or a sulfur atom. [Selection figure] None |
| priorityDate | 2014-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 265.