| abstract |
Provided is a photosensitive element excellent in transferability and degassing property of a photosensitive resin composition layer. The photosensitive element of the present invention comprises a support and a photosensitive resin composition layer formed on the support, and the photosensitive resin composition layer comprises (A) component: acid group. A polymer component containing a polymer (A1) having a structural unit (a1) having a group protected with an acid-decomposable group, component (B): a photoacid generator, component (C): And at least one compound represented by 1a) or (1b). In the formula, Ra represents an alkyl group having 1 to 20 carbon atoms, and Rb represents an alkylene group having 1 to 20 carbon atoms. [Selection figure] None |