Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
filingDate |
2015-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_153d9ab45d90d19234e4e5282fb77563 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_04d3730b6ad527289e0c18d5b14850d2 |
publicationDate |
2016-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2016095508-A |
titleOfInvention |
Resist composition and method for producing resist pattern |
abstract |
A resist composition capable of producing a resist pattern with good line edge roughness is provided. A resist composition containing a resin (A1) having an acid labile group, a resin (A2) having a structural unit (I), and an acid generator. [R 1 represents a hydrogen atom or a hydrocarbon group having 1 to 18 carbon atoms. A 1 represents a single bond, having from 1 to 6 carbon atoms alkanediyl group or -A 2 -X 1 - (A 3 -X 2) a - (A 4) b - represents a. R 2 represents a fluorinated saturated hydrocarbon group having 1 to 13 carbon atoms. ] [Selection figure] None |
priorityDate |
2014-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |