http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016089125-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14 |
| filingDate | 2014-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88d582b812cdf3e86064b9299c6affb4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2be8c1d8302d6fb84663820906c7f02 |
| publicationDate | 2016-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2016089125-A |
| titleOfInvention | Resin, resist composition and method for producing resist pattern |
| abstract | A resin contained in a resist composition for producing a resist pattern with good resolution is provided. A structural unit represented by formula (I), at least one structural unit selected from a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2): Containing resin. (R 1 is a hydrogen atom or a methyl group; X 1 is a single bond, —CO—O— * or —CO—NR 5 — *; X 2 is a single bond, * —O—L 1 — or * —CO—O. -L 2 -; L a1 and L a2 represents -O- or * -O- (CH 2) k1 -CO -O-; R a4 and R a5 H or methyl) [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7353144-B2 |
| priorityDate | 2014-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 333.