| abstract |
Provided is a thick film photosensitive composition for forming a thick film photoresist layer, which has high heat resistance. A composition comprising an acid generator (A), which is a sulfonic acid derivative compound represented by formula (I), and a hindered amine compound (B) as essential components. (R1-R6 are each independently H, C1-14 alkyl, C4-18 alkoxy, C4-18 alkylthio, etc .; R7 is C1-18 alkyl, C2-4 acyl, C6-20 aryl, C7 ~ 20 arylalkyl etc.) [Selection] None |