http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016085378-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_73e224665ceb7b15f8e66dfd0ee245c6 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate | 2014-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_28c885dbb7d12af050d9219ff66e3ba0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ae1895af798be19754e616f59e7163c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d780d07347605c4f125e9afebb97934b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb750dee249618ea7d00e7f945a427e1 |
| publicationDate | 2016-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2016085378-A |
| titleOfInvention | Resist stripper |
| abstract | A hard-baked resist film is more than necessary for polymerization of a novolac resin and a DNQ compound, and is firmly fixed to a metal film as a base. For this reason, there are cases in which a hard-baked resist film cannot be peeled off with a common resist stripping solution that can peel off the resist film on the Cu film, Cu / Mo film, and Al film. A resist stripping solution comprising a tertiary amine, a polar solvent, water, a cyclic amine, a sugar alcohol, and a reducing agent, and in particular, pyrrolidine or pyrrolidine 3-position as the cyclic amine And a resist stripping solution using hydrazine as a reducing agent and at least one of the compounds having a substituent bonded thereto. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I629352-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113614647-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020194420-A1 |
| priorityDate | 2014-10-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 108.