http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016069722-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_422beaf3b2be66e241e87a046660e232 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-54 |
| filingDate | 2014-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_48dbf1f2a6b7a1ba6550aa9cd3b1ded0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2b2e3d2c71a5cac9543c6e264b4312d0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f4a29e86fa2a8f933fc5e20680288ef |
| publicationDate | 2016-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2016069722-A |
| titleOfInvention | Thin film manufacturing equipment |
| abstract | PROBLEM TO BE SOLVED: To provide a method for stably producing a large area hydroxide thin film by a sputtering method and a large area hydroxide thin film. A sputtering apparatus of the present invention is a method for stably producing a hydroxide thin film and a large area by adding a water vapor supply mechanism and a cooling mechanism for controlling a water vapor partial pressure to a conventional sputtering apparatus. The hydroxide thin film can be provided. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018154868-A |
| priorityDate | 2014-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.