http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016051741-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f56b5174f7d196258707ccf1d609796e
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-365
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05166
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05155
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-01024
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2221-6834
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2221-68327
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-562
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-3512
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-9212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-02311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-03901
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53238
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-03849
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05171
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-0401
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L24-94
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-94
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-0381
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05644
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-525
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-0346
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-03848
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05569
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-13111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-131
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-1181
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-03464
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05562
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-02377
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-02313
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L24-13
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05084
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-0239
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-02331
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-03828
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-11849
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-05147
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L24-92
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6836
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-528
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-3114
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L24-05
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L24-03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L24-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L24-02
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-60
filingDate 2014-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_285b891499446840b44214e4f3f13dbd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d2c7d7c31ca5fb381fc99a20625484b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b19a836b80ca9e718eea530f5c7becbb
publicationDate 2016-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2016051741-A
titleOfInvention Manufacturing method of semiconductor device
abstract To improve the bonding reliability in flip chip bonding of a semiconductor device. A method for manufacturing a semiconductor device includes: a wiring connected to each of a plurality of electrode pads formed on a main surface of a semiconductor wafer; and a wiring that positions each of the plurality of electrode pads at different positions. A step of forming a Ni / Au film, a step of polishing the back surface of the semiconductor wafer, a step of reducing the surface of the Ni / Au film, and a step of forming solder bumps on the Ni / Au film. Have. In the reduction process, flux application, reflow, and cleaning processes are performed. After the reduction process is completed, solder bumps are bonded to the Ni / Au film. [Selection] Figure 8
priorityDate 2014-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007123577-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006203215-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005044979-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007165671-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419557048
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID412584819
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID1118
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID313

Total number of triples: 72.