| abstract |
An onium salt compound represented by formula (1). [Z + is a specific sulfonium cation or a specific iodonium cation. ] [Effect] The onium salt compound contained in the resist composition of the present invention functions well as an acid diffusion control agent. As a result, the mask error factor (MEF) and pattern line width fluctuation (LWR) are small, and the depth of focus is reduced. Excellent high resolution pattern profile can be constructed. Therefore, it is possible to cope with the shortening of the wavelength of the light source and the high numerical aperture (NA) of the projection lens. [Selection figure] None |