http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016027953-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b9a255559e1d94f20510a17a673b1078 |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-473 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-473 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2406 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-0011 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-0064 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J11-0015 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41J2-21 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41J2-01 |
filingDate | 2015-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e6e34903fe94adf0ba978bd87a878eb5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b0ab8bb362a311f6622034d152808222 |
publicationDate | 2016-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2016027953-A |
titleOfInvention | Printing apparatus, printing system, printed material manufacturing method, and program |
abstract | The surface roughness of an ink layer formed on an object to be processed is easily adjusted to a target surface roughness. A plasma processing unit 101 of a printing apparatus 170 performs plasma processing on a processing target surface side of an object to be processed. The recording unit 171 discharges ink to the processing target surface side of the object to be processed. The acquisition unit 160B acquires setting information in which the surface roughness adjustment target region and the surface roughness of the adjustment target region on the ink layer surface of ink are set. The plasma control unit 160D performs plasma with a plasma energy amount for setting the surface of the ink layer formed on the processing region to a set surface roughness corresponding to the adjustment target region on the processing target surface side of the workpiece. The plasma processing unit 101 is controlled to perform processing. [Selection] Figure 21 |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019043118-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2022049848-A1 |
priorityDate | 2014-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 56.