| abstract |
A photodegradable quencher that exhibits improved dissolution stability and reduced hygroscopic properties for triphenylsulfonium phenolate, and a photodegradable quencher that exhibits improved contrast and / or improved critical dimension uniformity. A photoresist composition comprising an agent is provided. A photodegradable quencher having a structure represented by the following formula. Wherein at least one of R 2 , R 3 , R 4 , R 5 , and R 6 is halogen, nitro, C 1-12 fluorinated alkyl, cyano, aldehyde, C 2-20 ester, C 2-20 ketone , C 1-20 sulfoxyl hydrocarbyl, C 1-20 sulfonyl hydrocarbyl, or sulfonamide. [Selection figure] None |