| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B13-0006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B13-003
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1888 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-037
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-322
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-0224 |
| filingDate |
2013-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2015-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2015526880-A |
| titleOfInvention |
Photo-activated etching paste and use thereof |
| abstract |
Improved etching method for etching transparent conductive oxide layers placed on flexible polymer substrates, rigid substrates such as glass, or silicon wafers is a novel etching paste activated by irradiation Including the use of |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018118962-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7357845-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7129167-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023037746-A1 |
| priorityDate |
2012-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |