http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015523716-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0121 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0123 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-461 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02024 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1454 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate | 2013-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2015523716-A |
| titleOfInvention | Method for manufacturing semiconductor device and method for using chemical mechanical polishing composition |
| abstract | A method of manufacturing a semiconductor device, comprising subjecting a III-V material to chemical mechanical polishing (CMP) under a CMP composition containing a specific nonionic surfactant. A chemical mechanical polishing composition comprising (A) inorganic particles, organic particles or a mixture or composite thereof, (B) at least one amphiphilic nonionic surfactant, and (M) an aqueous medium. A method for manufacturing a semiconductor device in which a layer or a substrate containing at least one III-V material is subjected to chemical mechanical polishing in the presence of an object, wherein the amphiphilic nonionic surfactant is (b1) at least one type It has a hydrophobic group and (b2) at least one hydrophilic group selected from the group consisting of polyalkylene groups, and the polyoxyalkylene group contains (b22) oxyalkylene monomers other than oxyethylene units. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017163847-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10759969-B2 |
| priorityDate | 2012-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 71.